Meet our upgraded #FinFET. Improved epitaxial growth allows more current through the channel. Enhanced metal gate drives higher channel mobility. Additional gate pitch provides higher drive current for functions requiring the utmost performance.
At Architecture Day 2020, Chief Architect @Rajaontheedge and @Intel fellows and architects provided details on the progress we are making on the six pillars of technology innovation: https://intel.ly/3fTE7xl
The inside of our factory is cleaner than about any other place on Earth. To avoid contaminating the manufacturing process the cleanroom air is continuously filtered making it up to 10,000 times cleaner than a hospital operating theatre #notyouraveragefactory